Litcius/Paper detail

Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition

Camila de Paula, Dara Bobb-Semple, Stacey F. Bent

2021Journal of materials research/Pratt's guide to venture capital sources16 citationsDOI

Topics & Concepts

Atomic layer depositionSelectivityNucleationMaterials scienceMonolayerChemical engineeringNanotechnologySmall moleculeActivator (genetics)Layer (electronics)ChemistryCatalysisOrganic chemistryBiochemistryGeneEngineeringSemiconductor materials and devicesElectronic and Structural Properties of OxidesMolecular Junctions and Nanostructures
Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition | Litcius