On the Contact Optimization of ALD-Based MoS<sub>2</sub> FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
Reyhaneh Mahlouji, Yue Zhang, Marcel A. Verheijen, Jan P. Hofmann, W. M. M. Kessels, Abhay A. Sagade, Ageeth A. Bol
Abstract
films.
Topics & Concepts
X-ray photoelectron spectroscopyAnnealing (glass)Materials scienceAtomic layer depositionNanotechnologyOptoelectronicsChemical vapor depositionTransistorAnalytical Chemistry (journal)Layer (electronics)ChemistryChemical engineeringVoltageElectrical engineeringComposite materialChromatographyEngineering2D Materials and ApplicationsMXene and MAX Phase MaterialsFerroelectric and Negative Capacitance Devices