Boosting hydrogen evolution performance by using a plasma-sputtered porous monolithic W<sub>2</sub>C@WC<sub>1−x</sub>/Mo film electrocatalyst
Shusheng Xu, Liuquan Yang, Yuzhen Liu, Yong Hua, Xiaoming Gao, Anne Neville
Abstract
A sputtering strategy is reported to prepare a porous W<sub>2</sub>C@WC<sub>1−x</sub>film on carbon cloth in a W, C and Ar ion plasma atmosphere. It exhibits excellent HER performance with a low overpotential (58 mV<italic>vs.</italic>RHE, −10 mA cm<sup>−2</sup>current density) and Tafel slope of 41 mV dec<sup>−1</sup>.
Topics & Concepts
Tafel equationOverpotentialElectrocatalystSputteringMaterials scienceAnalytical Chemistry (journal)HydrogenPlasmaCurrent densityThin filmElectrodeNanotechnologyChemistryPhysical chemistryElectrochemistryPhysicsNuclear physicsQuantum mechanicsOrganic chemistryChromatographyElectrocatalysts for Energy ConversionFuel Cells and Related MaterialsAdvanced battery technologies research